SEMES

History
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2022 05Opened an office in Woodlands, Singapore
2021 12The first to achieve an annual sales of 3 trillion KRW in Korea's equipment industry
2020 12Launched Prober ＜SEMPRO PRIME＞, Test Handler ＜STH-5800＞
2020 09Opened an office in Hsinchu, Taiwan
2020 01Awarded IR52 Jang Young-shil (OMEGA-K)
2019 06Launched Poly Etcher ＜MICHELAN C4＞
2019 02Launched Oxide Etcher ＜MICHELAN O3＞
2018 10Received the Presidential Citation and the Ministry Award on the 11th Semiconductor Day
2018 10Received the IR52 Jang Young-Shil Award (LOTUS)
2018 09Received the 'Best of the Best’ for Red Dot design awards (SEMPRO PRIME)
2017 10Received the Presidential Citation on the 10th Semiconductor Day
2017 03Launched 300mm Single Wafer Cleaner < LOTUS >
2016 12Launched Photo Track ＜OMEGA-S＞
2016 11Opened a R&D center in Hwaseong-si, Gyeonggi-do, Korea
2016 09Launched Saw&Sorter ＜SW9000＞
2016 09Launched Photo Track ＜OMEGA-K＞
2016 06Launched Oxide Etcher ＜MICHELAN O2＞
2015 12The first to achieve an annual sales of 1 trillion KRW in Korea's equipment industry
2015 07Installed 1,000 units of Single Wafer Cleaner ＜IRIS＞
2014 12Received the 400 million USD Export Tower
2014 11Launched Poly etcher ＜MICHELAN C3＞
2014 10Launched 300mm single wafer cleaner ＜IRIS PRIME＞
2014 07The world first launch of ＜SUPER CRYSTAL＞ single wafer cleaner for supercritical process
2014 05Opened a new branch office in Malta, New York in the US
2014 02Launched 1,000 units of Prober
2013 10Received the Ministry Award by MOTIE on the Semiconductor Day
2013 10Received the Ministry Award on the Display Day
2013 09Established a subsidiary office in Xian, China
2013 01Merged with SECRON Co., Ltd. and GES Co., Ltd.
2012 12Launched 300mm Single Wafer Cleaner ＜BLUEICE PRIME＞
2012 10Received the Chairman's Achievement Award of Korea Display Industry Association on the Display Day
2011 12Achieved the USD 100 million Export Tower and received the Minister Prize by Ministry of Knowledge Economy
2011 12Exceeded an accumulated sales of 1 trillion KRW in Single Wafer Cleaner < IRIS >
2011 12Launched Inkjet Printing System for manufacturing display panels
2011 10Received the Presidential Citation on the Semiconductor Day (LOZIX)
2010 10Received the Presidential Citation on the Semiconductor Day
2010 09Launched Single Wafer Cleaner for high-temp SPM process ＜BLUEICE SPM＞
2010 07Launched Photo Track ＜LOZIX High＞ for immersion process
2009 12Received the Prime Minister Prize, Small and Medium Business Administration Award (IRIS)
2009 11Received an award of IR52 Jang Young-shil (LOZIX)
2008 12Launched Photo Track < LOZIX >
2008 10Achieved the No.1 share in the global display cleaning equipment market
2008 10Exceeded an annual sales of KRW 100 billion in IRIS single product
2007 12The first to exceed an annual sales of 300 billion KRW in the equipment industry
2007 11Moved to a larger office in Cheonan
2007 06Achieved 20 times of non-accident record
2007 05Received the Chungmu-gong Award for Patent Technology Award by the Korean Intellectual Property Office
2007 03Launched the 8th generation TFT-LCD Coater Full Line
2006 10Received the Prime Minister's Award at the Korea Semiconductor Technology Awards (IRIS)
2006 07Launched the 7th generation TFT-LCD Slit Coater
2006 03Launched 300mm Single Wafer Cleaner < IRIS >
2005 10Launched 1,000 units of equipment
2005 08Launched the 300mm Arf Photo Track < NANOSPIN >
2005 02Changed the company name from KDNS Co., Ltd. to SEMES Co., Ltd.
2004 10Received the Presidential Citation at ＜the Award of a man of Merit by Korea Institute for Advancement of Technology＞ (K-SPIN12)
2004 02Received the Icheon Award (Minister Prize of the Ministry of Commerce, Industry and Energy Award) at the 6th Industrial Technology Innovation Awards
2003 12Received the IR52 Jang Young-shil award in the 7th week in 2004
2003 12Received the Prime Minister Award at the 10th anniversary of the KT (Excellent Korea Technology) Mark
2002 12Aquired K-SPIN12 S-MARK Certificate
2002 10Aquired K-SCRUBBER12 S-MARK Certificate
2002 09Received an award for men with merit at the 20th anniverssary event of the semi-conductor industry (MOTIE)
2002 07Localized and launched 300mm Single Wafer Cleaner < SWP3004 >
2001 09Obtained certificate of ISO-9001 / ISO-14001
2001 08Launched 300mm Photo Track < K-SPIN12 >
2001 08Launched 300mm Spin Etcher ＜SPE 300S＞
2001 07Received the Citation for excellent industrial accident prevention by Ministry of Employment and Labor
2001 06Launched 300mm Wet Station ＜K-WET300＞
2001 04Developed and launched a localized version of 300mm Spin Scrubber ＜K-Scrubber12＞
2000 11Received the award of USD 10 million export tower on the 37th Trade Day
2000 11Received the Minister Prize by MOTIE at the 30th Precision Technology Promotion Contest (Developed 300mm wafer cleaner)
2000 06Obtained K-SCRUBBER Safety Certificate (Korea Occupational Safety and Health Agency)
2000 04Obtained S-MARK Certificate (Korea Occupational Safety and Health Agency)
2000 03Developed a localized version of 300mm Spin Etcher ＜SPE 300S＞
1999 12Obtained Excellent Korean Technology (KT) Mark
1999 12Awarded the Minister Prize by Ministry of Trade, Industry and Energy (MOTIE)
1999 10Awarded Iron Tower Order of Industrial Service Merit (Korea Association of Machinery Industry)
1999 05Established the second factory
1998 10Opened a local corporate body in the US
1998 10Launched 200mm Photo Track < K-SPIN8 >
1998 09Developed K-WET (300mm Wet Station)
1998 04Launched the 100th Spin Scrubber
1997 09Obtained S2-93 Certificate (OSHA's management standards, the state gov't of the US)
1996 12Obtained ISO 9002 Certificate
1994 05Launched the first equipment (Wet Station)
1994 04Constructed a first plant
1993 01Established KDNS Co., Ltd.
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77, 4sandan 5-gil, Jiksan-eup, Seobuk-gu, Cheonan-si, Chungcheongnam-do, Republic of Korea,041.620.8000

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